Method for producing a transparent conductive oxide layer and a photovoltaic device including such a layer
AssigneeSanyo Electric Co., Ltd.
InventorsKenji Murata, Yasuo Kishi
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Abstract
A method for processing a transparent conductive oxide (TCO) layer in accordance with the present invention comprises the steps of: uniformly depositing the TCO layer on a substantially flat surface of a transparent substrate; and etching the exposed surface of the TCO layer thereof to roughen the exposed surface. The so-treated TCO layer is used as a transparent electrode in photovoltaic devices and has a decreased, substantially constant reflectance throughout the visible light range.
Claims12
A method for producing a transparent conductive oxide (TCO) layer on a transparent substrate having a substantially flat surface, comprising the following steps:
- uniformly depositing said TCO layer on said substantially flat surface of said transparent substrate;
- and chemically etching in an anisotropic manner with a chemical solution the entire exposed surface of said TCO layer for roughening said exposed surface thereby to provide a decreased, substantially constant light reflectance throughout the visible light range, wherein said exposed surface is roughened to have an unevenness of about 1000-5000 .ANG. with a periodicity of about 2000-10,000 .ANG..
A photovoltaic device comprising a transparent substrate with a substantially flat surface;
- a front electrode of a TCO layer formed on said flat surface of said substrate, said TCO layer having a chemically etched exposed surface having a roughness assuring a decreased, substantially constant reflectance throughout the visible light range, wherein said roughness of said exposed surface has an unevenness of about 1000-5000 .ANG. with a periodicity of about 2000-10,000 .ANG.;
- a semiconductor layer for photoelectric conversion formed on said exposed surface of said TCO layer;
- and a back electrode formed on said semiconductor layer.
Dependencies are inferred from the claim text.