Orbital polishing system
AssigneeBAF Industries
InventorLewis A. Ashworth
Life of this patent
Estimating the term…
Abstract
An orbital polishing system includes the drive motor assembly for orbitally rotating a buffing pad. The buffing pad includes contour means for defining a groove on a periphery thereof for supporting a buffing cloth thereon and an elastic O-ring is sized for holding the buffing cloth in the groove of the periphery of the buffing pad and operative with the groove for decreasing tension between the buffing pad and the buffing cloth on one side of the buffing pad as the buffing pad is orbitally rotated and pinching the buffing cloth into the groove on an opposite side of the buffing pad as the buffing pad is orbitally rotated in order to cause the buffing cloth to achieve and maintain a taut configuration across the face of the buffing pad.
Claims21
An orbital polishing system comprising:
- drive motor assembly means for orbitally rotating a buffing pad;
- a buffing pad having a face and a periphery thereabout;
- resilient means for tightly holding a buffing cloth against one side of the buffing pad periphery and releasing the buffing cloth from an opposite side of the buffing pad periphery in response to orbital rotation of the buffing pad, buffing cloth and resilient means by the drive motor assembly means causing the buffing cloth to achieve and maintain a taut configuration across the face of the buffing pad;
- and,
- means for preventing said resilient means from moving in a direction perpendicular to the plane of orbital rotation of the buffing pad.
An orbital polishing system comprising:
- drive motor assembly means for orbitally rotating a buffing pad;
- a buffing pad having a face and adapted for receiving a buffing cloth thereabout and including contour means for defining a groove on a periphery thereof for supporting the buffing cloth therein;
- and,
- elastic means for both decreasing tension between the buffing pad and the buffing cloth on one side of buffing pad and pinching the buffing cloth into the groove on an opposite side of the buffing pad in response to orbital rotation of the buffing pad causing the buffing cloth to achieve and maintain a taut configuration across the face of the buffing pad.
An orbital polishing system comprising:
- drive motor assembly means for orbitally rotating a buffing pad;
- a cylindrical buffing pad interconnected with said drive motor assembly means and having a back side and a face and adapted for receiving a buffing cloth thereabout, said cylindrical buffing pad means including contour means for defining a groove on a periphery thereof for supporting the buffing cloth therein;
- a buffing cloth sized for loosely fitting over the buffing pad face and periphery as well as a portion of the back side of the buffing pad and having biasing means for gathering the buffing cloth toward the center of the buffing pad on the back side thereof;
- and,
- elastic means cooperating with said biasing means and said contour means for causing the buffing cloth to achieve and maintain a taut configuration across the face of the buffing pad in response to orbital rotation of the buffing pad and buffing cloth.
An orbital polishing system comprising:
- drive motor assembly means for orbitally rotating a buffing pad and buffing cloth;
- a buffing pad having a face and a periphery thereabout and configured for attachment to said drive motor assembly;
- resilient means for causing the buffing cloth to achieve and maintain a taut configuration across the face of the buffing pad in response to the orbital rotation of the buffing pad and buffing cloth.
Dependencies are inferred from the claim text.