Heterogeneous conformal CVD of arsenosilicate glass
AssigneeBritish Telecommunications public limited company
InventorGareth W. B. Ashwell
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Abstract
The use of arsenosilicate glass (ASG) as a dielectric layer in semiconductors, and methods of producing arsenosilicate glasses as conformal coatings are described. The ASG coatings may be produced as the result of heterogeneous reactions involving silane, arsine and oxygen. In multilevel semiconductors ASG may be used over the polysilicon gates 3, over aluminum metallization 5 and second dielectric layer 6, and/or over second metallization 7.
Claims13
A process for fabricating a semiconductor device having a conformal dielectric coating of arsenosilicate glass disposed over underlying material layers having a topography which includes abrupt changes in vertical elevation, said process comprising the steps of
- locating said semiconductor device with said underlying material layers within chemical vapor deposition apparatus;
- maintaining the temperature of said device below about 500.degree. C. while controllably admitting a gaseous mixture comprising SiH.sub.4, O.sub.2, AsH.sub.3 and non-reactive diluent into the environment of said device wherein the volume ratio of silane to arsine lies in the range 3.8:1 to 11.7:1, with the volume ratio of oxygen to silane in the range of 18.5:1 to 41:1 so as to establish a predominantly heterogeneous deposition reaction onto the surface of said device and thereby achieve said conformal dielectric coating.
In a process for depositing a layer of arsenosilicate glass onto an underlying substrate via a chemical vapor deposition process including supplying a gaseous mixture of silane, oxygen, arsine and a non-reactive diluent and reacting the gaseous mixture to deposit an arsenosilicate film onto the substrate,
- the improvement comprising:
- (1) selectively adjusting the amount of arsine gas supplied to the gaseous mixture to control the silane/oxygen reaction and maintain a heterogeneous decomposition reaction onto the surface of the substrate substantially to the exclusion of a homogeneous reaction of silane and oxygen wherein the volume ratio of silane to arsine lies in the range 3.8:1 to 11.7:1, with the volume ratio of oxygen to silane in the range 18.5:1 to 41:1;
- and
- (2) depositing the arsenosilicate layer onto and in conformity with a substrate having a topography including abrupt changes in vertical elevation.
Dependencies are inferred from the claim text.