Method for drawing a pattern by charged beam and its apparatus
AssigneeKabushiki Kaisha Toshiba
InventorsMineo Gotou, Hideo Kusakabe
Life of this patent
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Abstract
The data in a counter in which a tolerable displacement of a table during the drawing in a sub-field and a movement of the table are compared in comparator. When the table movement exceeds a predetermined tolerable displacement preset in circuit for table movement correction, a signal for interrupting the pattern drawing is transferred to a control section. The main deflection position and the correction data for minor deflection distortion are set anew by a computer. Then, drawing of the remaining patterns is restarted.
Claims6
A charged beam drawing method for drawing a desired pattern on a specimen placed on a continuously moving table by using a major deflector with a large beam deflection width and a minor deflector with a small beam deflection width, said charged beam drawing method comprising the steps of:
- segmenting an area to be drawn into small areas within which the charged beam is deflectable;
- setting a major deflection position, as given by said major deflector for a small area;
- setting the correction data for minor deflection distortion, in connection with said major deflection position;
- drawing a pattern within said small area while correcting a minor deflection distortion on the basis of said correction data;
- feeding back to said major deflector the position data of said table when patterns are successively drawn in said small area, thereby to correct an incorrect displacement of the drawing position due to the movement of said table;
- interrupting said small area drawing by the minor deflector when said table moves from the position of said table when said small area drawing starts by a distance longer than a predetermined distance;
- resetting said major deflection position at a position allowing the drawing of the remaining patterns in said small area;
- resetting the minor deflection correction data in connection with the major deflection position after said major deflection position resetting;
- and
- drawing the remaining patterns in said small area.
A charged beam drawing apparatus having a major deflector with a large deflection width and a minor deflector for drawing a pattern in a small area, said charged beam drawing apparatus comprising:
- a table, on which a specimen to be irradiated by generated charged beam is placed;
- means for moving said table;
- means for detecting a movement of said table;
- means for correcting a deviation of the major deflection beam position caused by the movement of the table;
- means for setting a tolerable movement of said table during the small area drawing;
- means for drawing a predetermined pattern by using the charged beam;
- means for interrupting the drawing when the table movement exceeds a set value;
- means for resetting the major deflection position to a position allowing the drawing of the remaining pattern;
- means for resetting correction data for the minor deflection distortion in connection with said reset position;
- and
- means for drawing the remaining patterns after these settings are done.
Dependencies are inferred from the claim text.