Photosensitive composition with azide or bisazide compound with oxazolone group
AssigneeHitachi Chemical Company, Ltd.
InventorsSaburo Nonogaki, Ryotaro Irie, Michiaki Hashimoto, Takao Iwayanagi
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Abstract
A photosensitive composition comprising an azide compound represented by the formula: ##STR1## wherein each of X and Y is an aromatic substituent group, at least one of X and Y being an aromatic substituent group having an azide group, and n and m are zeros or integers of 1, and a polymeric compound. Since this composition has high resolution and is photosensitive to light having a wavelength of 436 nm, it permits employment of a reduction projection printer and is suitable for fabrication of semiconductor devices.
Claims6
A photosensitive composition for providing a negative-type photoresist which is sensitive to light at 436 nm and which is capable of providing a high resolution image, said composition comprising an admixture of a photosensitive azide compound represented by the formula:
- ##STR49## wherein each of X and Y is an aromatic substituent group, at least one of X and Y being a p-azidophenyl group, and n and m are zeros or integers of 1, and a polymeric compound;
- the amount of azide compound ranging from 0.5 to 100% by weight based on the polymeric compound.
Dependencies are inferred from the claim text.