X-ray dispersive and reflective structures
AssigneeOvonic Synthetic Materials Company, Inc.
InventorsStanford R. Ovshinsky, John Keem, Steven A. Flessa, James L. Wood, Keith L. Hart, Lennard Sztaba
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Abstract
X-ray dispersive and reflective structures and materials are provided which exhibit at least one third of the theoretical integral reflection coefficient for the structures in the range of interest without fluorescence or absorption edges. The materials can be thermally activated to control the desired properties, during or post deposition. The structures can be deposited by ion beam absorption techniques to form the structures in a precise manner. The index of the refraction of the structures can be continuously varying throughout the structures.
Claims11
An X-ray dispersive structure having high reflectivity within a wavelength range of interest within a range of 8.34 Angstroms to 120 Angstroms, said structure comprising a plurality of sputter deposited substantially amorphous layer pairs formed on one another on a substrate, each layer pair consisting of a different material, the said two said different materials being characterized by chemically stable interfaces with the materials of the layer pair having:
- (1) a Pauling electronegativity difference therebetween less than 1.0 volts;
- (2) a covalent radius difference therebetween less than 1.00 Angstroms;
- and
- (3) a bond length difference therebetween less than 1.60 Angstroms;
- said layers having an interface roughness of less than 1.40 Angstroms therebetween;
- the adsorption edges and fluorescence of the materials of the structure being outside the wavelength range of interest and the individual layers and layer pairs having a constant d spacing as a function of thickness through the dispersive structure.
Dependencies are inferred from the claim text.