Apparatus for the treatment of substrates in a gas stream

An apparatus for the treatment of substances in a gas stream, in particular for the absorption and/or the adsorption or the filtering of gases, having a first preferably inner chamber for supplying a gas, a second, preferably outer chamber for removing the gas and a plurality of annular treatment spaces which are arranged one above the other in an axial direction and interposed between the first and the second chamber and which are separated from one another and from the first and the second chamber by walls in each case and which each comprise at least one upper inlet opening for a treatment medium consisting of solid particles in the upper part and at least one lower outlet opening for the treatment medium in the lower part, each treatment space having fresh, purified and/or regenerated treatment medium supplied to it at the upper inlet opening by way of at least one duct, and an evacuation apparatus for removing the treatment medium being provided at the lower outlet opening of each treatment space which opens into the first chamber, the outlet openings forming inlets for the gas into the treament spaces which in each case are connected at their upper part to the second chamber, each treatment space--with the exception of the lowest treatment space--extending with the lower part bounded by its walls into the upper part of the underlying treatment space and being connected there to the underlying treatment space by a passage opening, characterized in that the treatment spaces (5) or the walls (8, 8';

• 9, 9') bounding these treatment spaces (5) respectively form part of a rotor-like unit which is mounted so as to be rotatable about the axial direction (S) and is driven in a rotating manner, and the duct is arranged in a fixed manner for the supply of fresh treatment medium (23) and comprises portions (26) which extend into the upper inlet openings (27) and have openings for supplying the treatment medium (23).