Etchant composition
AssigneeDaikin Industries, Ltd.
InventorsTsuneo Fujii, Takayuki Deguchi, Sinji Tamaru
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Abstract
An etchant composition comprising (a) a cerium (IV) salt, (b) a nonionic or anionic fluorine-containing surfactant, (c) water, and (d) optionally, at least one compound selected from the group consisting of perchloric acid, acetic acid, sulfuric acid, nitric acid and hydrochloric acid and salts thereof, which can homogeneously etch a resist pattern having thin gaps as well as wide gaps on a chrome layer.
Claims9
An etchant composition comprising
- (a) a cerium (IV) salt,
- (b) at least one nonionic or anionic fluorine-containing surfactant,
- (c) water, and
- (d) optionally, at least one compound selected from the group consisting of perchloric acid, acetic acid, sulfuric acid, nitric acid and hydrochloric acid and salts thereof.
An etchant composition, where in the fluorine-containing surfactant is at least one having at least one functional group selected from the group consisting of --O--, --OH, --COO--, --COOH, --SO.sub.4, --SO.sub.3 -- and --PO.sub.4 <.
Dependencies are inferred from the claim text.