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US 4,724,328 AGranted
Lithographic apparatus for the production of microstructures
AssigneeSiemens Aktiengesellschaft
InventorBurkhard Lischke
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AssigneeSiemens Aktiengesellschaft
InventorBurkhard Lischke
Estimating the term…
Lithographic apparatus for producing microstructures which comprises a particle beam source 1 and a condenser lens system 2, 3 and a controllable aperture diaphragm 4 having line-shaped multi-hole structures 17 . . . 22 for generating a plurality of particle beam fingers. A blanking diaphragm and an imaging optic structure 6, 7 OL are also provided. The invention produces a higher output of exposed structures than the prior art and for this purpose the particle beams are combined to form a ribbon beam which has the greatest cross-sectional dimension 12, 13 approximately in the longitudinal direction 23 of the line-shaped multi-hole structure 17 . . . 22 and which has the smallest cross-sectional dimension which does not significantly exceed the width of the multi-hole structure. The multiple beams are utilized in lithographic apparatus for generating semiconductor circuits in the submicrometer region on a GaAs base and for generating components for optical communications technology.
A lithography apparatus for producing microstructures comprising, a particle beam source, a condenser lens system (2, 3), a controllable aperture diaphragm (4) having a line-shaped multi-hole structure (17 . . . 22) for generating a plurality of particle beam fingers, a blanking diaphragm (5), an imaging optics (6, 7, OL) and a workpiece particularly a semiconductor body (9), characterized in that the particle beam is formed into a ribbon beam with a larger cross-sectional dimension (12, 13) which extends roughly in the longitudinal direction (23) of said line-shaped multi-hole structure (17 . . . 22) and which has a smaller cross-sectional dimension which does not significantly exceed the width of said multi-hole structure, deflection electrodes for individual blanking of the particle probes are mounted on the aperture diaphragm;
Dependencies are inferred from the claim text.