Method for fabricating periodically multilayered film
AssigneeSanyo Electric Co., Ltd.
InventorsHisao Haku, Yukio Nakashima, Kaneo Watanabe, Tsugufumi Matsuoka
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Abstract
A method for fabricating a periodically multilayered film having a plurality of amorphous thin layers of different kinds stacked periodically is performed by forming at least one kind of the layers in the stack by a photo CVD method, whereby a more definite periodicity in the composition of the lattice and fewer defects are achieved.
Claims12
A method for fabricating a periodically multilayered film having a plurality of amorphous thin layers of different kinds stacked periodically to form a stack, comprising the step of assuring a more definite periodicity in the composition of said stack by forming at least one type of said layers in said stack by photo CVD, whereby defects in the stack are reduced.
Dependencies are inferred from the claim text.