Method of manufacturing a magnetic thin film
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsMasaki Aoki, Hideo Torii, Hideyuki Okinaka, Masayuki Sakai
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Abstract
An organic metal compound containing elements constituting a magnetic material and an oxygen gas are introduced into plasmas at a low pressure and a thin film of magnetic oxide is prepared on an organic film or aluminum at low temperature.
Claims11
A method of manufacturing a magnetic thin film, wherein a gas of a metal organic compound containing elements constituting a magnetic material and oxygen as a reaction gas is decomposed in high frequency plasmas, magnetron discharge plasmas or electron cyclotron plasmas under a pressure from 10 to 10.sup.-4 Torr, and a thin film of magnetic oxide is deposited on a substrate at a temperature of up to 350.degree. C. or with no heating of the substrate.
Dependencies are inferred from the claim text.