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US 4,698,295 AGranted
Polyimides, a process for their preparation and their use, and tetracarboxylic acids and tetracarboxylic acid derivatives
AssigneeCiba-Geigy Corporation
InventorsJosef Pfeifer, Rudolf Duthaler
Life of this patent
Estimating the term…
Abstract
Polyimides which essentially consist of 0.1 to 100 mol % of at least one structural element of the formula I ##STR1## and 99.9 to 0 mol % of at least one structural element of the fomula II and/or III ##STR2## in which and Z' are a tetravalent aromatic radical, Q' is a trivalent aromatic radical, X and X' are a divalent radical of an organic amine are autophotocrosslinkable. They are suitable for the production of protective films and photographic relief images.
Claims38
A process for the preparation of a crosslinked protective coating on a carrier which comprises
- exposing to light or high-energy radiation a coating of a radiation-sensitive polymer applied on said carrier wherein the polymer is a homopolyimide or a copolyimide of at least one aromatic tetracarboxylic acid and at least one diamine, which essentially contains 0.1 to 100 mol % of at least one structural element of the formula I ##STR44## and 99.9 to 0 mol % of at least one structural element of the formulae II and/or III ##STR45## in which Z is at least one tetravalent radical of the formula IV, V, VI or VII ##STR46## in which the free bonds are in the ortho-position relative to one another and Y is direct bond, --CH.sub.2 --, --(CH.sub.2).sub.2 --, --O--, --S--, --SO--, --SO.sub.2 --, --CO--, --NR-- or --CRR.sup.1 --, in which R is a hydrogen atom, C.sub.1 -C.sub.10 -alkyl, phenyl, naphthyl or phenyl-(C.sub.a H.sub.2a)-, where a is 1-4, and R.sup.1 is R, with the exception of a hydrogen atom, Ro is C.sub.1 -C.sub.10 -alkyl, halogen, --CN, --NO.sub.2, C.sub.1 -C.sub.12 -alkoxy, phenoxy, naphthoxy or phenyl-(C.sub.a H.sub.2a), where a is 1-4, n' is 0, 1 or 2, X is an unsubstituted or substituted divalent aliphatic radical, or said radical interrupted by heteroatoms or aromatic, heterocyclic or cyloaliphatic groups, a substituted or unsubstituted heterocyclic, cycloaliphatic or araliphatic radical, an aromatic radical, in which two aryl nuclei are linked via an aliphatic group, or an aromatic radical which is substituted by at least one alkyl group, cycloalkyl group, alkoxy group, alkoxyalkyl group, alkylthio group, alkylthioalkyl group, hydroxyalkyl group, hydroxyalkoxy group, hydroxyalkylthio group, aralkyl group or, in the case of two adjacent C atoms of the aromatic radical, by an alkylene group, Q' is a trivalent aromatic radical, Z' has the same meaning as Z or is a tetravalent organic radical othen than Z and X' is the divalent radical, other than X, of an organic diamine, and in which Z in formula I is also a tetravalent benzophenone radical if structural elements of the formula III are present.
A process for the preparation of a relief image on a carrier which comprises
- exposing to light or high-energy radiation imagewise through a photomask a radiation-sensitive polymer applied on said carrier wherein the polymer is a homopolyimide or a copolyimide of at least one aromatic tetracarboxylic acid and at least one diamine, which essentially contains 0.1 to 100 ml % of at least one structural element of the formula I ##STR64## and 99.9 to 0 mol % of at least one structural element of the formulae II and/or III ##STR65## in which Z is at least one tetravalent radical of the formula IV, V, VI or VII ##STR66## in which the free bonds are in the ortho-position relative to one another and Y is a direct bond, --CH.sub.2 --, --(CH.sub.2).sub.2 --, --O--, --S--, --SO--, --SO.sub.2 --, --CO--, --NR-- or --CRR.sup.1 --, in which R is a hydrogen atom, C.sub.1 -C.sub.10 -alkyl, phenyl, naphthyl or phenyl(C.sub.a H.sub.2a)-, where a is 1-4, and R.sup.1 is R, with the exception of a hydrogen atom, R.sup.o is C.sub.1 -C.sub.10 -alkyl, halogen, --CN, --NO.sub.2, C.sub.1 -C.sub.12 -alkoxy, phenoxy, naphthoxy or phenyl-(C.sub.a H.sub.2a)-, where a is 1-4, n' is 0, 1 or 2, X is an unsubstituted or substituted divalent aliphatic radical, or said radical interrupted by heteroatoms or aromatic, heterocyclic or cycloaliphatic groups, a substituted or unsubstituted heterocyclic, cycloaliphatic or araliphatic radical, an aromatic radical, in which two aryl nuclei are linked via an aliphatic group, or an aromatic radical which is substituted by at least one alkyl group, cycloalkyl group, alkoxy group, alkoxyalkyl group, alkylthio group, alkylthioalkyl group, hydroxyalkyl group, hydroxyalkoxy group, hydroxyalkylthio group, aralkyl group or, in the case of two adjacent C atoms of the aromatic radical, by an alkylene group, Q' is a trivalent aromatic radical, Z' has the same meansing as Z or is a tetravalent organic radical other than Z and X' is the divalent radical, other than X, of an organic diamine, and in which Z in formula I is also a tetravalent benzophenone radical if structural elements of the formula III are present, and
- then removing the non-exposed portions with a solvent.
Dependencies are inferred from the claim text.