Radiation-sensitive polycondensates, processes for their preparation coated material and its use

A radiation-sensitive linear saturated homopolymer or copolymer, selected from the group consisting of the polyamides and polyamide-imides, which comprises

• (a) 100 to 10 mol %, based on the total polymer, of at least one of the recurring structural units of formula I, formula II or mixtures thereof ##STR22## (b) 0 to 90 mol %, based on the total polymer of recurring structural units of formula III, formula IV or mixtures thereof ##STR23## in which the imide group in structural element II is bonded to two adjacent C atoms, m is 0 or a number from 1 to 4, p is 0 or a number from 1 to 5 and n is 0 or a number from 1 to 3, X is --NR.sup.7 -- and Y independently has the same meaning as X, R.sup.1 is alkyl or alkoxy having less than 6 C atoms, aryl having 6 to 10 C atoms, aralkyl having 7 to 10 C atoms or halogen, R is an unsubstituted divalent aliphatic, cycloaliphatic, araliphatic or aromatic radical;
• or said aliphatic radical substituted by halogen, by alkyl of 1 to 6 C atoms or by alkoxy of 1 to 6 C atoms;
• or said cycloaliphatic radical substituted by alkyl of 1 to 4 C atoms, or said araliphatic radical substituted on the aryl by alkyl of 1 to 6 C atoms;
• or said aromatic radical substituted by alkoxyalkyl, alkoxy, by alkyl of 1 to 6 C atoms, by trimethylene or tetramethylene;
• or R and one of the radicals R.sup.7 together are alkylene having 5 to 7 C atoms, to which the second --NR.sup.7 -- group is bonded, or R is methylene, ethylene or propylene and the two radicals R.sup.7 of the NR.sup.7 groups together are ethylene or propylene, R.sup.2 is an unsubstituted divalent aliphatic or aromatic hydrocarbon radical;
• or said aliphatic radical substituted by halogen, by alkyl of 1 to 6 C atoms or by alkoxy of 1 to 6 C atoms;
• or said aromatic radical substituted by alkoxyalkyl, by alkoxy, by alkyl of 1 to 6 carbon atoms, by trimethylene or by tetramethylene;
• or R.sup.2 and R.sup.7 together are alkylene having 5 to 7 C atoms, R.sup.4 independently has the same meaning as R, and R.sup.6 independently has the same meaning as R.sup.2, R.sup.3 is a divalent saturated aliphatic or aromatic radical, R.sup.5 is a trivalent saturated aliphatic or aromatic radical in which the imide group is bonded to two adjacent C atoms and R.sup.7 is a hydrogen atom, alkyl, cycloalkyl, aryl, aralkyl or alkaralkyl.