Apparatus for producing semiconductor devices

An apparatus for producing semiconductor devices comprising:

• a dry etching unit for dry etching a material to be treated, said dry etching unit having an etching chamber in which said material to be treated is etched, an electrode for applying RF power to said material to be treated which is securely held in position and a gas introduction means for introducing etching gases into said etching chamber;
• a heat-treatment unit having a hot air blowing means for blowing hot air against at least one surface of said material etched in said dry etching unit thereby to heat said material under atmospheric pressure;
• a transport means for transferring said material to be heated from said dry etching unit to said heat-treatment unit, said transport means connected to said dry etching unit and said heat-treatment unit.

An apparatus for producing semiconductor devices comprising:

• a dry etching unit for dry etching a material to be treated;
• and
• a heat-treatment unit communicating with said dry etching unit, said heat-treatment unit having a case whose opposing side walls are formed with an inlet for said material to be treated and an outlet for said treated material, a transporting means for transporting said material to be treated from said inlet to said outlet of said case, and a heating means disposed adjacent to said transporting means for heating under atmospheric pressure said material which is transported by said transporting means, said heating means having a contact heating means for making substantial contact with at least one surface of the material.

An apparatus for producing semiconductor devices comprising:

• a dry etching unit for dry etching a material to be treated;
• and
• a heat-treatment unit communicating with said dry etching unit, said heat-treatment unit having a case whose opposing side walls are formed with an inlet for said material to be treated and an outlet for said treated material, a transporting means for transporting said material to be treated from said inlet to said outlet of said case, and a heating means disposed adjacent to said transporting means for heating under atmospheric pressure said material which is transported by said transporting means, said heating means having a hot air blowing means for blowing hot air against at least one surface of said material.

An apparatus for producing semiconductor devices comprising:

• a dry etching unit for dry etching a material to be treated;
• and
• a heat-treatment unit communicating with said dry etching unit, said heat-treatment unit having a case whose opposing side walls are formed with an inlet for said material to be treated and an outlet for said treated material, a transporting means for transporting said material to be treated from said inlet to said outlet of said case, and a heating means disposed adjacent to said transporting means for heating under atmospheric pressure said material which is transported by said transporting means, said heating means having a contact heating means for making substantial contact with at least one surface of said material and a hot air blowing means for blowing hot air against at least another surface of said material.

An apparatus for producing semiconductor devices comprising:

• an etching unit for dry etching a material to be treated;
• and
• a heat-treatment unit directly connected to said dry etching unit, said heat-treatment unit having a case whose opposing side walls are formed with an inlet for said material to be treated and an outlet for said treated material, respectively, a transportation means for transporting said material to be treated from said inlet to said outlet of said case, and a hot air blowing means which is disposed adjacent to said transportation means and which blows hot air against said material being transported by said transportation means to heat said material under atmospheric pressure.

An apparatus for producing semiconductor devices comprising:

• an etching unit for dry etching a material to be treated;
• and
• a heat-treatment unit directly connected to said dry etching unit, said heat-treatment unit having a case whose opposite side walls are formed with an inlet for said material to be treated and an outlet for said treated material, respectively, a transportation means for transporting said material to be treated from said inlet to said outlet of said case, and a contact heating means which is disposed adjacent to said transportation means and which, in the case of heating, is raised to make substantial contact with at least one surface of said material being transported by said transportation means to heat said material under atmospheric pressure.

An apparatus for producing semiconductor devices comprising:

• an etching unit for dry etching a material to be treated;
• and
• a heat-treatment unit directly connected to said dry etching unit, said heat-treatment unit having a case whose opposing side walls are formed with an inlet for said material to be treated and an outlet for said treated material, respectively, a transportation means for transporting said material to be treated from said inlet to said outlet of said case, a contact heating means which is disposed adjacent to said transportation means and which, in the case of heating, is raised to make substantial contact with at least one surface of said material being transported by said transportation means, and a hot air blowing means which is disposed adjacent to said transportation means and which blows hot air against said material whereby said contact heating means and said hot air blowing means heat said material under atmospheric pressure.