Electroless plating process and process for producing multilayer wiring board
AssigneeHitachi, Ltd.
InventorsMidori Imura, Makoto Morijiri, Masanobu Hanazono, Shinichi Kazui, Youzi Miura, Hiroyuki Ogino
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AssigneeHitachi, Ltd.
InventorsMidori Imura, Makoto Morijiri, Masanobu Hanazono, Shinichi Kazui, Youzi Miura, Hiroyuki Ogino
Estimating the term…
In a selective electroless plating process suitable for formation and correction of a minute pattern by plating film, irradiation of the surface of a workpiece with a laser beam serves to selectively activate the surface of the workpiece to allow an electroless plating film to deposited on only the activated portions. The portion of the workpiece where plating is effected is irradiated with a radiation energy beam to form a damaged portion, which is contact with a plating bath during and/or after the irradiation to selectively from a plating film on the damaged portion. The portion of a workpiece where a pole as the connector part of a multilayer wiring board is to be formed is irradiated with a laser beam and allowed to have a pole selectively formed only thereon.
An electroless plating process comprising irradiating a surface of a workpiece with a radiation energy beam to effect activation of the surface necessary for electroless plating,
An electroless plating process comprising irradiating a surface of a workpiece with a radiation energy beam to effect activation of the surface necessary for electroless plating,
An electroless plating process comprising irradiating a plating portion of a workpiece with a radiation energy beam to effect activation of said plating portion necessary for electroless plating so as to form a damaged portion, and
An electroless plating process as claimed in claim 7 or 9, wherein said plating film is formed by contacting said portion of said workpiece with an electroless plating liquid after formation of said damaged portion.
A process for producing a multilayer wiring board comprising supplying a laser beam and a plating liquid to a connector part to form a pole by plating for effecting interlayer connection between a conductor layer and another conductor layer formed thereon in a high-intensity packaging board,
A process for producing a multilayer wiring board as claimed in claim 13, wherein an insulating layer is formed after the formation of said pole by plating.
A process for producing a multilayer wiring board as claimed in claim 14, wherein said pole by plating is formed in a through-hole preliminarily formed.
Dependencies are inferred from the claim text.