Back to results
US 4,645,977 AGranted
Plasma CVD apparatus and method for forming a diamond like carbon film
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsHideo Kurokawa, Tsutomu Mitani, Taketoshi Yonezawa
Life of this patent
Estimating the term…
Abstract
A plasma CVD apparatus comprises a first vacuum enclosure with a plasma generating means, an accelerating means for accelerating ions in a plasma toward a substrate and a second vacuum enclosure connected to the first vacuum enclosure, so that the plasma gas flows into the second vacuum enclosure and forms a film of uniform and superior quality at high speed.
Claims19
A Plasma CVD apparatus comprising:
- a first vacuum enclosure provided with a plasma generating means for producing plasma gas from reactive gas or mixed gas of reactive gas and inert gas,
- an accelerating means for accelerating at least ions in said plasma against a substrate,
- a second vacuum enclosure which is connected to said first vacuum enclosure in a manner that said plasma gas can flow into said second vacuum enclosure for containing said substrate therein.
A plasma CVD apparatus comprising:
- a first vacuum enclosure provided with a plasma generating means for making reactive gas or mixed gas of reactive gas and inert gas being plasma gas,
- an accelerating and neutralizing means for accelerating at least ions in said plasma gas against said substrate and for making at least a part of said accelerated ions being neutral particles,
- a second vacuum enclosure connected to said first vacuum enclosure in a manner that said plasma gas can flow into said second vacuum enclosure, and
- said substrate being disposed in said second enclosure.
1 more element
A method for composing diamond-like carbon film comprising the steps of:
- putting a substrate in an enclosure containing hydrocarbon gas or mixed gas of hydrocarbon gas and argon gas,
- exciting said gas, thereby to produce plasma gas which includes ions, radical and neutral seed, of simple substance of carbon, hydrogen and argon and of hydrocarbon and further including electron in a first vacuum enclosure comprising a plasma generating means, and
- accelerating at least ions to a substrate by an accelerating means and blowing said plasma gas against said substrate in a second vacuum enclosure, thereby to produce a diamond-like carbon film.
A method for composing diamond-like carbon film comprising the steps of:
- exciting hydrocarbon gas or mixed gas of hydrocarbon gas and argon gas, thereby to produce plasma gas which includes ions, radicals and neutral, of each simple substance of carbon, hydrogen and argon and of hydrocarbon and further including electron in a first vacuum enclosure comprising a plasma generating means,
- accelerating by an accelerating and neutralizing electrode at least said ions to said substrate and making at least a part of said accelerated ions neutral particles and further blowing said plasma gas against said substrate in said second vacuum enclosure, thereby to form diamond-like carbon film.
Dependencies are inferred from the claim text.