Method and apparatus for evaluating surface conditions of a sample
AssigneeTherma-Wave, Inc.
InventorsAllan Rosencwaig, Walter L. Smith
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AssigneeTherma-Wave, Inc.
InventorsAllan Rosencwaig, Walter L. Smith
Estimating the term…
An apparatus and method is disclosed for evaluating surface conditions on a sample. The system is particularly suited for detecting thin residues encountered in semiconductor lithographic and etching processes. The system is also capable of measuring ion implanted dopant concentrations prior to annealing. The apparatus includes an intensity modulated laser beam which is focused on the surface of the sample to generate periodic heating. A second light beam is focused onto the periodically heated area of the sample in a manner such that it is reflected to a detector. The intensity changes in the probe beam, resulting from the temperature induced changes of reflectivity at the surface of the sample, are measured and evaluated to determine the absence or presence of residues, or to measure the concentrations of ion implanted dopants.
An apparatus for evaluating the surface conditions of a sample by measuring intensity variations of a reflected probe beam resulting from periodic changes in optical reflectivity of the sample induced by localized periodic heating, said apparatus comprising:
An apparatus for detecting residues on a sample by measuring intensity variations of a reflected probe beam resulting from periodic changes in optical reflectivity of the sample induced by localized periodic heating, said apparatus comprising:
An apparatus for measuring dopant concentrations in a sample by measuring intensity variations of a reflected probe beam resulting from periodic changes in optical reflectivity of the sample induced by periodic heating, said apparatus comprising:
A method for evaluating the surface conditions on a sample by measuring intensity variations of a reflected probe beam resulting from the periodic changes in optical reflectivity of the sample induced by localized periodic heating, said method comprising the steps of:
A method for detecting residues on a sample by measuring intensity variations of a reflected probe beam resulting from the periodic changes in optical reflectivity of the sample induced by localized periodic heating, said method comprising the steps of:
A method for measuring dopant concentrations in a sample by measuring intensity variations of a reflected probe beam resulting from the periodic changes in optical reflectivity of the sample induced by localized periodic heating, said method comprising the steps of:
Dependencies are inferred from the claim text.