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US 4,631,250 AGranted
Process for removing covering film and apparatus therefor
AssigneeResearch Development Corporation of Japan
InventorChikara Hayashi
Life of this patent
Estimating the term…
Abstract
A process for removing covering films by blowing CO.sub.2 particles against the film. Fine ice particles may be mixed with the CO.sub.2 particles.
Claims2
A process for removing a covering film from a surface of a substrate wherein CO.sub.2 particles, produced in an air-tight sealed chamber, are blown from a jet nozzle by N.sub.2 gas, said CO.sub.2 particles being introduced into a treatment chamber against a covering film applied to the surface of the substrate.
Dependencies are inferred from the claim text.