Preparation of printing plate by pattern exposing both sides of curable liquid resin
AssigneeAsahi Kasei Kogyo Kabushiki Kaisha
InventorSeiichi Uchida
Life of this patent
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Abstract
A printing plate consisting of a base portion, a mount portion and a relief portion made of a liquid resin which is sensitive to and curable by irradiated activating rays, the plate being prepared by use of a masking sheet formed with a transmitting pattern having a contour corresponding to and slightly larger than the pattern of a negative film, a semi-transmitting pattern positioned outside the transmitting pattern and having a large contour for transmitting irradiated activating rays upon attenuation, and a blocking surface positioned outside the semi-transmitting pattern and having an effect to block the activating rays to an extent not to cure the liquid resin layer.
Claims4
A process for preparing a resin printing plate by forming a layer of liquid resin on a negative film having a transmitting pattern, the liquid resin being curable by irradiation with activating rays, superposing on the liquid resin layer a transparent base film and a masking sheet formed with a transmitting pattern having a contour corresponding to and slightly larger than the transmitting pattern, irradiating the resin layer from below the negative film and above the masking sheet with activating rays to cure the resin layer and form a relief portion matching the transmitting pattern of the negative film, a mount portion supporting the relief portion and a base portion supporting the base part of the mount portion and joined to the base film, and removing the uncured liquid resin, the process being characterized in that the masking sheet is formed with a transmitting pattern having a contour corresponding to and slightly larger than the pattern of the negative film, a semi-transmitting pattern positioned outside the transmitting pattern and having a larger contour for transmitting the irradiating activating rays upon attenuation, and a blocking surface positioned outside the semi-transmitting pattern and having an effect to block the activating rays to an extent not to cure the liquid resin layer, the base portion formed on the base film by the irradiation with the activating rays being in match with the semi-transmitting pattern of the masking sheet, the base film being exposed outside the base portion.
Dependencies are inferred from the claim text.