Organic solvent-soluble photosensitive polyamide resin
AssigneeUbe Industries, Ltd.
InventorsTsunetomo Nakano, Hiroshi Yasuno, Kazuaki Nishio
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Abstract
An organic solvent-soluble photosensitive polyamide resin usable for producing photoset resin product having excellent heat resistance and electrical and mechanical properties, comprising a polycondensation product of an aromatic dicarboxylic acid component with an aromatic diamine component consisting of 10 to 100 molar % of a photosensitive diamine compound of the formula (I) and 10 to 90 molar % of a non-photosensitive diamine compound of the formula (II), H.sub.2 N--R.sub.1 --NH.sub.2 (I) H.sub.2 N--R.sub.2 --NH.sub.2 (II) wherein R.sub.1 represents an aromatic divalent residue having a photosensitive radical and R.sub.2 represents an armoatic divalent residue having no photosensitive radical.
Claims10
An organic solvent-soluble photosensitive polyamide resin comprising a polycondensation product of an aromatic dicarboxylic acid component consisting of at least one member selected from the group consisting of aromatic carboxylic acids and acid halides thereof with an aromatic diamine component consisting of 10 to 100 molar % of at least one member selected from the group consisting of diamino chalcone compounds and aromatic diamine compounds of the formula ##STR12## wherein X represents a divalent radical selected from the group consisting of --CO--O-- and --CH.sub.2 --O--;
- R.sub.3 represents a radical selected from the group consisting of ##STR13## R.sub.4 represents a member selected from the group consisting of --CH.dbd.CH.sub.2 and ##STR14## R.sub.5 represents a member selected from the group consisting of hydrogen and --NH--CO--R.sub.4 ;
- R.sub.6 represents a member selected from the group consisting of hydrogen and alkyl having from 1 to 5 carbon atoms;
- and R.sub.7 represents a member selected from the group consisting of CH.sub.2 .dbd.CH--COOCH.sub.2 CH.sub.2 OOC-- and CH.sub.2 .dbd.C(CH.sub.3)--COOCH.sub.2 CH.sub.2 OOC--;
- and 0 to 90 molar % of at least one aromatic diamine compound of the formula (II):
- H.sub.2 N--R.sub.2 --NH.sub.2 (II)
- in which formula (II) R.sub.2 represents a nonphoto crosslinkable aromatic divalent residue.
Dependencies are inferred from the claim text.