Method for manufacturing dielectric metal titanate
AssigneeSony Corporation
InventorsSatoru Uedaira, Hiroshi Yamanoi, Hidemasa Tamura
Life of this patent
Estimating the term…
Loading patent…
AssigneeSony Corporation
InventorsSatoru Uedaira, Hiroshi Yamanoi, Hidemasa Tamura
Estimating the term…
A method for manufacturing dielectric metal titanate MTiO.sub.3 where M represents Ba and Sr is disclosed, which comprises the steps of preparing aqueous alkaline solution containing at least one metal salt selected from the group of barium and strontium and immersing metal titanium into the solution to form the metal titanate MTiO.sub.3 where M is at least one of barium and strontium. Further, there is disclosed a method for manufacturing dielectric metal titanate MTiO.sub.3 where M represents Ba and/or Sr which comprises the steps of preparing aqueous solution containing at least one metal salt selected from the group of barium and strontium, forming a metal titanium layer on a substrate, and immersing the substrate with the metal titanium layer into the solution to convert the metal titanium layer into the dielectric metal titanate MTiO.sub.3 where M is at least one of barium and strontium.
Method for manufacturing dielectric metal titanate MTiO.sub.3 where M represents Ba and/or Sr comprising the steps of:
Method for manufacturing dielectric metal titanate MTiO.sub.3 where M represents Ba and/or Sr comprising the steps of:
Dependencies are inferred from the claim text.