Process for preparing chlorosilanes from silicon and hydrogen chloride using an oxygen promoter
AssigneeUnion Carbide Corporation
InventorThomas H. Barker, Jr.
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Abstract
Chlorosilanes with an enhanced hydrogen content are selectively produced in the direct reaction of silicon with hydrogen chloride at elevated temperatures by treating the silicon with a source of oxygen during the process. A process is also provided for producing selectively trichlorosilane by reacting hydrogen chloride with a fluidized bed of silicon particles and treating the silicon particles with the source of oxygen.
Claims13
In the process for producing chlorosilanes of the formula H.sub.x SiCl.sub.4-x, wherein x is an integer from 0 to 3, by reacting silicon with hydrogen cholride at elevated temperatures, the improvement which comprises (a) treating the silicon with a source of oxygen to initially fluidize the silicon, (b) reacting the fluidized silicon with hydrogen chloride until selectivity decreases, and (c) thereafter intermittently fluidize the silicon with a source of oxygen to selectively form chlorosilanes which contain hydrogen.
A process for preparing trichlorosilane comprising:
- (a) directly reacting hydrogen chloride and silicon by feeding hydrogen chloride gas through a fluidized bed of silicon particles at an elevated temperature;
- (b) treating said silicon particles with a source of oxygen;
- and
- (c) continuously withdrawing reaction products from the reaction.
Dependencies are inferred from the claim text.