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US 4,577,111 AGranted
Apparatus for electron beam lithography
AssigneeHitachi, Ltd.
InventorsNorio Saitou, Susumu Ozasa, Takashi Matsuzaka
Life of this patent
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Abstract
An apparatus for electron beam lithography comprises at least one mask equipped with a polygonal aperture to be subjected to an electron beam from an electron beam generator, an electron lens system for demagnifying and imaging the polygonal aperture of the mask, and a solenoid coil for electron beam rotation adjustment placed between the mask and the final-stage electron lens.
Claims6
An apparatus for electron beam lithography comprising:
- means for generating an electron beam;
- first electrooptic means for shaping said electron beam to yield a desired sectional shape, said first electrooptic means including at least one mask having a polygonal aperture;
- second electrooptic means for demagnifying and imaging a shaped beam produced by said first electrooptic means onto a sample face and for deflecting the shaped beam;
- and
- third electrooptic means placed between said first and second electrooptic means for rotating and adjusting said shaped beam, said third electrooptic means including a solenoid coil having a focal distance which is at least five times as large as the distance between said first and second electrooptic means.
2 more elements
Dependencies are inferred from the claim text.