Semiconductor fabricating apparatus
AssigneeHandotai Kenkyu Shinkokai
InventorsJun-ichi Nishizawa, Tadahiro Ohmi
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Abstract
A semiconductor fabricating apparatus is capable of fabricating a high quality semiconductor with utilization of crystal growth, thermal oxidation of CVD membrane growth at low temperature. The semiconductor fabricating apparatus includes a reaction chamber having a gas inlet and a gas outlet, an insulative support means disposed in the reaction chamber for supporting semiconductor wafers thereon, an infrared lamp means for irradiating exposed surfaces of the semiconductor wafers and an ultra-violet lamp means for irradiating the exposed surfaces of the semiconductor wafers overlappingly with the infrared irradiation.
Claims4
A semiconductor fabricating apparatus comprising a reaction chamber having a gas inlet and a gas outlet, a support means disposed in said reaction chamber for supporting semiconductor wafers thereon, an infrared lamp means for irradiating exposed surfaces of said semiconductor wafers and an ultra-violet lamp means for irradiating said exposed surfaces of said semiconductor wafers overlappingly with said infrared irradiation, further comprising a vacuum means connected to said reaction chamber for evacuating an interior of said reaction chamber to maintain an inner pressure thereof at a super low pressure prior to a commencement of reaction.
Dependencies are inferred from the claim text.