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US 4,557,796 AGranted
Method of dry copper etching and its implementation
AssigneeInternational Business Machines Corporation
InventorsFrank Druschke, Georg Kraus, Ulrich Kuenzel, Wolf D. Ruh, Rolf Schaefer
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Abstract
According to this method, copper is dry etched in a glow discharge containing compounds with at least one methyl or methylene group, particularly at temperatures close to room temperature. The method is applied in particular for making conductors on or in module substrates or circuit cards, solder spots, and the wiring of magnetic thin films.
Claims13
Method of copper dry etching in a glow discharge containing organic compounds, characterized in that compounds with at least one methyl or methylene group are used for etching.
Dependencies are inferred from the claim text.