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US 4,544,622 AGranted
Negative-acting photoresist imaging system
AssigneeMinnesota Mining and Manufacturing Company
InventorWilliam L. Kausch
Life of this patent
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Abstract
A negative-acting photoresist imaging system is provided having a substrate, a metal layer, a latently sensitized, crosslinkable, negative-acting photoresist base layer, and a negative-acting photoresist layer. The system may further have an organic protective coat between the metal layer and the base layer, a matte top layer, and/or an antistatic layer on the back side of the substrate.
Claims23
A negative-acting photoresist imaging system comprising:
- (a) a substrate;
- (b) a metal layer adhered to said substrate;
- (c) a latently sensitized crosslinkable, negative-acting photoresist base layer adhered to said metallic layer, said base layer comprising:
- (i) a polyfunctional acrylate monomer;
- (ii) an organic, polymeric, polyfunctional film-forming binder with more than one acryloyl group pendant therefrom;
- (iii) a polyfunctional, thermally activated, acid group crosslinking agent;
- (iv) an acid group-bearing polymeric binder;
- and
- (v) a non-active, photosensitive free-radical generator;
- and
- (d) a negative-acting photoresist layer adhered to said base layer, said photoresist layer comprising:
- (i) a polyfunctional acrylate monomer;
- (ii) an organic, polymeric, polyfunctional film-forming binder with more than one acryloyl group pendant therefrom;
- (iii) a polyfunctional, thermally activated, acid group crosslinking agent;
- (iv) an acid group-bearing polymeric binder;
- (v) a non-active, photosensitive free-radical generator;
- and
- (vi) an active, photosensitive free-radical generator.
15 more elements
Dependencies are inferred from the claim text.