Process for metallization of dielectric substrate through holes
AssigneeE. F. Johnson Company
InventorRuth A. May
Life of this patent
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Abstract
A method of metallizing through holes in dielectric substrates with a metallizing material comprising forming a hole in the substrate utilizing laser techniques, depositing a layer of a dielectric on the side wall of the hole and then depositing a layer of a metallizing material onto the dielectric layer.
Claims16
A method of metallizing through holes in dielectric substrates with a metallizing material comprising:
- forming a through hole in said substrate utilizing laser techniques;
- depositing a first layer of material on the sidewall of said through hole to form an adhesive bridge between the sidewall of said through hole and the metallizing material;
- and
- depositing a second layer of an electrically conductive metallizing material onto said first layer, said first layer comprising a glass filled dielectric material having a thermal coefficient compatible with said substrate and having properties enabling it to bond to both the sidewall of said through holes and said electrically conductive second layer.
A method of copper metallization of laser bored through holes in a dielectric substrate, said method comprising:
- depositing a first layer on the sidewall of said through hole, said first layer comprising a glass filled dielectric material having thermal expansion characteristics compatible with said substrate and being capable of bonding to the sidewall of said through hole and the metallizing copper to form an adhesive bridge between the sidewall of said through hole and the metallizing copper;
- and
- depositing a layer of the metallizing copper over said first layer so as to form a conductive path between opposing sides of said dielectric substrate.
A method of copper metallization of laser bored through holes in an alumina dielectric substrate for a printed circuit board comprising:
- depositing a glass filled alumina dielectric on the sidewall of said laser bored through hole so as to form an adhesive bridge between the sidewall of said through hole and said metallizing copper.
A method of metallizing through holes in dielectric substrates with a metallizing material comprising:
- forming a through hole in said substrate utilizing laser techniques;
- depositing a first layer of material on the sidewall of said through hole to form an adhesive bridge between the sidewall of said through hole and the metallizing material;
- and
- depositing a second layer of an electrically conductive metallizing material onto said first layer, said first layer comprising a glass filled alumina dielectric material having properties enabling it to bond to both the sidewall of said through holes and said electrically conductive second layer.
A method of metallizing through holes in dielectric alumina substrates with a metallizing material comprising:
- forming a through hole in said substrate utilizing laser techniques;
- depositing a first layer of material on the sidewall of said through hole to form an adhesive bridge between the sidewall of said through hole and the metallizing material;
- and
- depositing a second layer of an electrically conductive metallizing material onto said first layer, said first layer comprising a glass filled dielectric compatible with said alumina substrate to form a bond therebetween having properties enabling it to bond to both the sidewall of said through holes and said electrically conductive second layer.
A method of metallizing through holes in dielectric alumina substrates with a metallizing material comprising:
- forming a through hole in said substrate utilizing laser techniques;
- depositing a first layer of material on the sidewall of said through hole to form an adhesive bridge between the sidewall of said through hole and the metallizing material;
- and
- depositing a second layer of an electrically conductive metallizing material onto said first layer, said first layer comprising a glass filled alumina dielectric having properties enabling it to bond to both the sidewall of said through holes and said electrically conductive second layer and said metallizing material being copper.
A method of copper metallization of laser bored through holes in a dielectric substrate, said method comprising:
- depositing a first layer on the sidewall of said through hole, said first layer comprising a glass filled alumina dielectric and being capable of bonding to the sidewall of said through hole and the metallizing copper to form an adhesive bridge between the sidewall of said through hole and the metallizing copper;
- and
- depositing a layer of the metallizing copper over said first layer so as to form a conductive path between opposing sides of said dielectric substrate.
Dependencies are inferred from the claim text.