Method or preparing nonlaminating anisotropic boron nitride
AssigneeThe United States of America as represented by the Secretary of the Army
InventorsLouis E. Branovich, Bernard Smith, Gerard L. Freeman
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Abstract
Non laminating anisotropic boron nitride is prepared by reacting a boron halide with ammonia at a temperature of from 1100.degree. C. to 1600.degree. C. in the presence of a small amount of a volatile oxygen containing compound. The small amount of volatile oxygen containing compound is sufficient to prevent lamination yet small enough to prevent the finalized product from losing its anisotropy.
Claims8
Method of preparing non laminating anisotropic boron nitride comprising reacting a boron trihalide with ammonia at a temperature of 1100.degree. C. to 1600.degree. C. in the presence of a small amount of a volatile oxygen containing compound, the small amount of volatile oxygen containing compounds being sufficient to prevent lamination yet small enough to prevent the finalized product from losing its anisotropy.
Method of preparing non laminating anisotropic boron nitride comprising reacting boron trichloride with ammonia according to the reaction:
- BCl.sub.3 +4NH.sub.3 .revreaction.BN+3NH.sub.4 Cl
- at a temperature of 1100.degree. C. to 1600.degree. C. in the presence of a small amount of water sufficient to prevent lamination yet small enough to prevent the finalized product from losing its anisotropy.
Dependencies are inferred from the claim text.