Method for manufacturing an optical memory element
AssigneeShap, Inc.
InventorsKenji Ohta, Junji Hirokane, Hiroyuki Katayama, Akira Takahashi, Hideyoshi Yamaoka
Life of this patent
Estimating the term…
Abstract
An optical memory element includes stripe-shaped grooves formed directly on a glass substrate. To manufacture the optical memory element, a resist film is disposed on the glass substrate, and a groove pattern is formed in the resist film. A reactive ion etching is conducted through the groove pattern formed in the resist film so as to form the guide grooves in the glass substrate. After removing the resist film from the glass substrate, a magneto-optical recording layer is formed on the glass substrate.
Claims16
A method for manufacturing an optical memory element comprising the steps of:
- providing a substrate;
- disposing a resist film on said substrate;
- forming a guide groove pattern latent image on said resist film;
- developing said guide groove pattern latent image formed on said resist film;
- conducting an etching operation through said developed guide groove pattern so as to form guide grooves in said substrate;
- removing said developed guide groove pattern from said substrate;
- and
- disposing a recording medium layer on said substrate having said guide grooves formed therein.
A method for manufacturing an optical memory element comprising the steps of:
- providing a glass substrate;
- disposing a resist film on said substrate;
- forming a guide groove pattern latent image on said resist film;
- developing said guide groove pattern latent image formed on said resist film;
- conducting an etching operation through said developed guide groove pattern so as to form guide grooves in said glass substrate;
- removing said developed guide groove pattern resist film from said glass substrate;
- disposing a first dielectric layer on said glass substrate having said guide grooves formed therein;
- disposing a recording medium layer on said first dielectric layer;
- and
- disposing a second dielectric layer on said recording medium layer.
A method for manufacturing an optical memory element comprising the steps of:
- providing a substrate;
- forming a SiO.sub.2 layer on said substrate;
- disposing a resist film on said SiO.sub.2 layer;
- forming a guide groove pattern latent image on said resist film;
- developing said guide groove pattern latent image formed on said resist film;
- conducting an etching operation through said developed guide groove pattern so as to form guide grooves in said SiO.sub.2 layer;
- removing said developing guide groove pattern resist film from said SiO.sub.2 layer;
- disposing a first dielectric layer on said SiO.sub.2 layer having said guide grooves formed therein, said first dielectric layer having the index of refraction higher than that of said SiO.sub.2 layer;
- disposing a recording medium layer on said first dielectric layer;
- and
- disposing a second dielectric layer on said recording medium layer.
Dependencies are inferred from the claim text.