A system for measuring electrical resistance during manufacture of thin, conductive films deposited on a substrate by means of evaporation of sputter-deposition in an evacuated processing unit, comprising:
- a movable substrate holder;
- a reference substrate on the holder;
- electrode means for measuring an electrical resistance of a deposited film on the reference substrate;
- and transmitting means physically connected to the movable substrate and electrically connected to the electrodes for making resistance measurements and transmitting the measurements to an exterior of the processing unit by electromagnetic radiation.