Method for manufacturing finger electrode structures forming electric contacts at amorphous silicon solar cells
AssigneeSiemens Aktiengesellschaft
InventorsMatthias Moeller, Helmold Kausche
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Abstract
A method for manufacturing finger type electrode structures which form electric contacts at solar cells consisting of amorphous silicon. The substrate is first coated with a chromium-nickel layer and then a substantially pure nickel layer. After immersion in a mildly activated fluxing agent, a tin alloy layer is applied by dipping. The method enables the manufacture of very low resistance contact fingers at a p-i-n type solar cell provided with an ITO (In/Sn/oxide) layer.
Claims8
A method for the manufacture of finger type electrode structures forming electric contacts on solar cells consisting of amorphous silicon layers which comprises:
- vapor depositing a chromium-nickel layer over said silicon layers,
- vapor depositing a substantially pure nickel layer over said chromium-nickel layer,
- immersing the thus coated body into a fluxing agent, and dipping the coated body into a tinning bath containing a tin alloy which is molten in the range of 210.degree. to 230.degree. C.
A solar cell structure comprising:
- a substrate comprising layers of amorphous silicon having p type, intrinsic, and n type conductivity respectively,
- an indium-tin oxide layer over said layers on the substrate, and finger type electrodes deposited on said indium-tin oxide layer, said electrodes having a base layer of a nickel-chromium alloy, an intermediate layer of substantially pure nickel, and an outer layer of a tin-lead-silver solder alloy.
Dependencies are inferred from the claim text.