Method of forming thin vapor deposited film of organic material
AssigneeFuji Photo Film Co., Ltd.
InventorsGoro Akashi, Akira Nahara, Yoshihiro Arai
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Abstract
A process for forming a vapor-deposited thin layer of organic material is disclosed. The process involves placing organic material on a support base within a vacuum chamber and providing a heat source in the vicinity of the organic material. A second support base is then provided within the vacuum chamber and heat is applied to the organic material at a temperature which causes the organic material to form vapors. The vapors are vapor-deposited on the second support base forming the thin layer of organic material. It is generally desirable to move both of the support bases during the vapor deposition process allowing the formation of a continuous uniform thin layer of organic material.
Claims6
A process for forming a vapor-deposited organic thin film, comprising the steps of:
- continuously supplying fresh organic evaporation source material to a vapor-deposition zone by continuously transporting a fresh segment of a support base made of a heat resisting material and having an organic evaporation source material on a surface thereof through a vapor-deposition zone within an evaporation chamber;
- providing a second support base material within said evaporation chamber;
- providing a heating means with said evaporation chamber, in the vicinity of said support base having said organic evaporation source material thereon;
- heating said organic evaporation source material with said heating means to a temperature such that said organic evaporation source material forms a vapor;
- and vapor depositing said vapor on said second support base.
Dependencies are inferred from the claim text.