Apparatus and method of line pattern analysis
OwnerWolf D. Seufert, Roger A. Coteinventors
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Abstract
The disclosure herein describes an apparatus and a method of analysis of line patterns such as fingerprints, ideograms, or the like, which comprises the steps of superimposing a centrosymmetric reference pattern of lines over the line pattern to be analyzed to form an interferometric pattern of the moire type, positioning the reference pattern on a characteristic element of the line pattern to be analyzed, and enlarging it until the lines of the reference pattern fill the space between adjacent lines closest to the characteristic element to thereby translate the superimposed line patterns into a field pattern of different optical densities.
Claims18
A method of analysis of a line pattern comprising the steps of:
- superimposing a centrosymmetric reference pattern of lines over the line pattern to be analysed to form an interferometric pattern of the moire type;
- positioning said reference pattern on a characteristic element of said line pattern to be analysed by gradually enlarging the reference pattern until the lines thereof fill the space between adjacent lines closest to said characteristic element to thereby translate said superimposed line patterns into a field pattern of different optical densities;
- and
- electronically measuring said optical densities.
A method of automated analysis of a line pattern comprising the steps of:
- superimposing a centrosymmetric reference pattern of lines over said line pattern to be analysed to form an interferometric pattern of the moire type;
- positioning said reference pattern on a characteristic element of said line pattern to be analysed;
- adjusting said reference pattern by gradually enlarging said reference pattern until the lines thereof fill the space between adjacent lines closest to said characteristic element whereby said superimposed line patterns are translated into a field pattern of different optical densities;
- scanning and measuring electronically said optical densities;
- storing data obtained from said scanning and measuring.
An apparatus for analysing a line pattern comprising:
- a centrosymmetric reference pattern of lines adapted to be superimposed over a line pattern to be analysed to form an interferometric pattern of the moire type;
- means for adjusting said reference pattern relative to said pattern to be analysed including means for gradually enlarging said reference pattern until the lines of said reference pattern fill the space between adjacent lines closest to a characteristic element on said line pattern to be analysed to thereby translate said superimposed line patterns into a field pattern of different optical densities;
- means for electronically scanning and measuring said optical densities.
Dependencies are inferred from the claim text.