Off-line, recirculating, waste management system for chemical lasers
AssigneeRockwell International Corporation
InventorRaymond F. Walsh, IV
Life of this patent
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AssigneeRockwell International Corporation
InventorRaymond F. Walsh, IV
Estimating the term…
A waste management system for a DF or HF chemical laser or certain other types of chemical lasers wherein the exhaust gases of the laser are fed into a reaction chamber 12 having a collection sump region 14 at the bottom. A Supply tank 16 is loaded with lithium and is coupled to the chamber 12 by a valved feed line 18. Heating means 44 maintains the lithium in a liquid state. Pressurization means 40 pumps the lithium through the feed line 18 into an injector 32 which delivers the lithium to the chamber 12 where the lithium reacts with the exhaust gases. The reaction forms solid and/or liquid waste products which are collected in the sump region 14. After the laser is shut off, the pressure means 40 coupled to the supply tank 16 is replaced by a vacuum pump 44 which acts through a return line 20 coupling the tank 16 to the sump region 14. The waste products are drawn out of the chamber 12 into the tank 16, the tank lines 18 and 20 are disjoined, and the tank 16 is emptied. The tank lines can then be reconnected and the operation repeated once the tank has been recharged with fresh lithium.
A waste management system for removing the exhaust products of a chemical laser, comprising:
Dependencies are inferred from the claim text.