Hydrosilazane polymers from [R.sub.3 Si].sub.2 NH and HSiCl.sub.3
AssigneeDow Corning Corporation
InventorJohn P. Cannady
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Abstract
A process is disclosed for preparing R.sub.3 SiNH-containing hydrosilazane polymer by contacting and reacting trichlorosilane with a disilazane [R.sub.3 Si].sub.2 NH where R is vinyl, hydrogen, phenyl, or alkyl radicals containing 1 to 3 carbon atoms. These hydrosilazane polymers are useful, when fired at high temperatures, in the formation of silicon nitride and silicon nitride-containing ceramic materials.
Claims36
A process of preparing a R.sub.3 SiNH-containing hydrosilazane polymer, which process consists of contacting and reacting, in an inert, essentially anhydrous atmosphere, trichlorosilane with a disilazane at a temperature in the range of 25.degree. to 300.degree. C. while distilling by-produced volatile products, wherein said disilazane has the general formula
- (R.sub.3 Si).sub.2 NH
- where R is selected from the group consisting of vinyl, hydrogen, phenyl, and alkyl radicals containing 1 to 3 carbon atoms.
A process of preparing a R.sub.3 SiNH-containing hydrosilazane polymer, which process consists of contacting and reacting, in an inert, essentially anhydrous atmosphere, purified trichlorosilane with a disilazane at a temperature in the range of 125.degree.-275.degree. C. while distilling by-produced volatile products, wherein said purified trichlorosilane and disilazane are contacted in such a manner that the initial reaction temperature resulting from the initial exotherm is less than 50.degree. C., wherein said purified trichlorosilane and disilazane are reacted by raising the temperature to 125.degree.-275.degree. C. at a rate of less than about 1.degree. C./minute, and wherein said disilazane has the general formula
- (R.sub.3 Si).sub.2 NH
- where R is selected from the group consisting of vinyl, hydrogen, phenyl, and alkyl radicals containing 1 to 3 carbon atoms.
Dependencies are inferred from the claim text.