Josephson junction element and method of making the same
AssigneeRikagaku Kenkyusho
InventorHiroshi Ohta
Life of this patent
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Abstract
A Josephson junction element which comprises a substrate, a first strip-like superconductor thin film layer arranged on said substrate, a second strip-like superconductor thin film layer arranged on said first superconductor layer in crossing relation thereto, an insulator layer disposed between said first and second superconductor layer at the crossing area and a weak link portion connecting said first and second layer together across the sides of the thickness of said insulator layer. A method for manufacturing such Josephson junction element.
Claims7
A method for manufacturing a Josephson junction element, comprising the steps of forming a first strip-like super-conductor thin film on a substrate, forming an insulator layer on said first strip-like superconductor thin film in crossing relation thereto, forming a second strip-like superconductor thin film on said insulator layer in overlapping relation thereto, subjecting said second strip-like superconductor thin film thus produced to sputter-cleaning, and then forming a thin film of weak link material which crosses over and covers the second superconductor thin film over the crossing area of the second strip-like superconductor thin film and extends across both sides of the thickness of the insulator layer exposed between said crossing first and second superconductor thin films.
A method for manufacturing a Josephson junction element comprising forming a first strip-like superconductor film on a substrate, forming an insulator layer on said first strip-like superconductor thin film in crossing relation thereto, forming a second strip-like superconductor thin film on said insulator layer in overlapping relation thereto, subjecting the second strip-like superconductor thin film thus formed to sputter-cleaning, forming a thin film of weak link material on the whole surface of said second superconductor thin film, forming a plurality of photoresist masks in the form of lines extending in parallel with each other at distances narrower than the width of said first strip-like superconductor thin film upon the thin film of said weak link material, and removing the part of the weak link material which is not covered by said photoresist masks so that the remaining weak link material crosses over said second superconductor thin film.
A method for manufacturing a Josephson junction element comprising forming a first strip-like superconductor thin film on a substrate, forming an insulator layer on said first strip-like superconductor thin film in crossing relation thereto, forming a second strip-like superconductor thin film on said insulator layer in overlapping relation thereto, arranging a photoresist mask having a plurality of windows in the form of lines extending in parallel with each other at distances narrower than the width of said first strip-like superconductor thin film against said first strip-like superconductor thin film, subjecting the surface thereof to sputter-cleaning, and then sputtering or depositing weak link material through said windows onto said surface so that the weak link material crosses over said second superconductor thin film.
A method for manufacturing a Josephson junction element comprising forming a first strip-like superconductor thin film on a substrate, forming an insulator layer on said first strip-like superconductor thin film in crossing relation thereto, forming a second strip-like superconductor thin film on said insulator layer in overlapping relation thereto, subjecting the second superconductor thin film thus formed to sputter-cleaning, forming a thin film of weak link material on the whole surface of said laminated thin film, forming a plurality of photoresist masks in the form of lines extending in parallel with each other at distances narrower than 1/2 of the width of said first strip-like superconductor thin film upon said thin film of the weak link material, and then removing the part of the weak link material which is not covered by the photoresist masks so that the remaining weak link material crosses over said second superconductor thin film.
A method for manufacturing a Josephson junction element comprising forming a first strip-like superconductor thin film on a substrate, forming an insulator layer on said first strip-like superconductor thin film in crossing relation thereto, forming a second strip-like superconductor thin film on said insulator layer in overlapping relation thereto, arranging a photoresist mask having a plurality of windows in the form of lines extending in parallel with each other at distances narrower than 1/2 of the width of said first strip-like superconductor thin film against said first strip-like superconductor thin film, subjecting the surface thereof to sputter-cleaning, and then sputtering or depositing weak link material through said windows onto said surface so that the weak link material crosses over said second superconductor thin film.
Dependencies are inferred from the claim text.