Method for depositing material with nanometer dimensions
AssigneeInternational Business Machines Corporation
InventorsGerd K. Binnig, Christoph E. Gerber, Heinrich Rohrer, Edmund Weibel
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Abstract
This method involves the deposition of free metal atoms (4) from the apex (5) of a pointed tip (1) supported at a distance of 10 to 20 nm from a substrate (2). The atoms (4) are being field-desorbed under the influence of a strong electric field existing between the tip (1) and the substrate (2). With the tip (1) being moved across the substrate (2), a narrow trace (6) of metal atoms will be deposited on the substrate.
Claims11
Method for depositing material from a conductive tip onto the surface of a substrate, said tip being supported at a controlled distance shorter than 10.sup.-8 m from said substrate, characterized in that said tip (1) is provided with free metal atoms (4) at its surface, the atoms (4) at the operating temperature of the tip (1) having a sufficiently large mobility to permit their movement versus the apex (5) of said tip (1), and that between said tip (1) and said substrate (2) a potential difference is maintained the level of which is sufficient to lead to field-desorption of said free metal atoms (4) across said distance between said tip (1) and said substrate (2) and to the deposition of said atoms (4) on said substrate (2).
Dependencies are inferred from the claim text.