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US 4,537,855 AGranted
Photopolymerizable photosensitive composition
AssigneeMitsubishi Chemical Industries Limited
InventorHiroshi Ide
Life of this patent
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Abstract
A photopolymerizable photosensitive composition characterized by comprising a photopolymerizable photosensitive resin having polyfunctional ethylenically unsaturated groups in the side chains or end groups thereof, and a photopolymerization initiator.
Claims25
A photopolymerizable photosensitive composition comprising:
- (a) a photopolymerizable photosensitive high molecular weight compound having polyfunctional ethylenically unsaturated groups in the side chains or end groups thereof, wherein said polyfunctional ethylenically unsaturated groups have structural units of the general formula ##STR10## wherein R.sup.1 represents a hydrogen atom, alkyl group or hydroxyalkyl group, R.sup.2 represents an alkylene group, R.sup.3 and R.sup.4 independently represent a hydrogen atom or methyl group, R.sup.5 represents a hydrogen atom or carboxyl group, m is 0 or 1 and n is 2 or 3 provided that m+n=3, p is an integer of 1 to 3, and q is an integer of 0 to 3 and
- (b) a photopolymerization initiator.
Dependencies are inferred from the claim text.