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US 4,537,813 AGranted
Photomask encapsulation
AssigneeAT&T Technologies, Inc.
InventorBirol Kuyel
Life of this patent
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Abstract
A photomask (50) used for form patterns on a resist coated semiconductor wafer is comprised of a light transmissive baseplate (52) having a metallic pattern (54) thereon. A plasma deposited SiO.sub.2 conformal, electrically resistive, coating (56) covers the patterned baseplate (52), wherein the coating material is substantially the same refractive index as the baseplate.
Claims4
A photomask comprising:
- a light transmissive, selectively metallized baseplate;
- and
- a plasma deposited, electrically resistive SiO.sub.2 coating conformally covering the baseplate wherein the coating is a lossy dielectric and has substantially the same refractive index as the baseplate.
Dependencies are inferred from the claim text.