Device for treating gases at high temperatures
AssigneeWacker-Chemitronic Gesellschaft fur Elektronik-Grundstoffe mbH
InventorsHelmut Hamster, Franz Koppl
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Abstract
A device is provided for treating gases or mixtures of gases at high temptures, such as, for example, for the reaction, known as tetraconversion, of silicon tetrachloride with hydrogen to form trichlorosilane. The device has a heat-insulated housing having gas-inlet and gas-outlet openings and a plurality of resistance heaters disposed in the housing that are directly electrically heated and around or through which the gases to be treated flow. According to a preferred embodiment, the device is also provided with an integrated heat-exchanger unit.
Claims3
A device for treating silicon-containing gases at high temperatures, comprising:
- a heat-insulated, generally hollow housing having a top wall, a sidewall, and a bottom plate defining a reaction chamber and gas-inlet and gas-outlet openings respectively leading into and from said housing;
- and
- a plurality of inert resistance heaters which are heatable by the direct passage of an electric current therethrough and which are arranged in a standing, generally upright manner in said housing spaced from said top wall and bottom plate thereof such that they are arranged between said top wall and bottom plate in the general path of gases flowing between said openings so as to have direct contact therewith said gases, said standing resistance heaters terminating at their upper ends in an electrically conductive interconnection and each having at its lower end a separate lead leaving said housing through separate insulated openings in said bottom plate and terminating outside said reaction chamber and being star-connected in a balanced multiple-phase alternating current system.
Dependencies are inferred from the claim text.