US 4,536,464 A · Photosensitive composition with o-quinonediazide compound and condensate of dihydric phenol and aldehyde or ketone

Abstract

The photosensitive composition suitable as a posi-posi photosensitive composition for photosensitive lithographic printing plates is composed of a high molecular compound shown by following general formula I or II and an o-naphthoquinonediazide compound; ##STR1## wherein R.sub.1 is a hydrogen atom, an alkyl group having 1 to 8 carbon atoms and R.sub.2 and R.sub.3 each is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. When the photosensitive composition is used as a photosensitive layer of a photosensitive lithographic printing plate and the plate is developed by rubbing with a sponge containing a developer, the photosensitive composition at the exposed areas is completely removed leaving no patches of the composition.

Claims7

Dependent claims

A photosensitive composition comprising in admixture, a high molecular compound having the structure shown by following general Formula I or II and an o-naphthoquinonediazide as a photosensitive compound;

##STR3## wherein R.sub.1 represents an ethyl group, a n-propyl group, a n-butyl group, a t-butyl group or a n-pentyl group and R.sub.2 and R.sub.3 each represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, wherein the proportion of the high molecular compound in the photosensitive composition is 2 to 90% by weight and wherein the o-naphthoquinonediazide compound is present in the composition in an amount in the range of 10% to 50% by weight.

Dependencies are inferred from the claim text.

Facts

Application

06/550,420Filed 10 Nov 1983

Priority

JP 57-19610810 Nov 1982

Granted

20 Aug 1985

Term ends

Not estimatedThe source records don’t support an estimate.

Classification8 codes

G03F 7/0236
Characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides: condensation products of…
C08G 8/20
Of formaldehyde, e.g. of formaldehyde formed in situ: with polyhydric phenols
C08K 5/28
Compounds containing a nitrogen atom bound to two other nitrogen atoms, e.g. diazoamino-compounds: azides
G03C 1/72
Photosensitive materials: photosensitive compositions not covered by the groups G03C1/005 - G03C1/705

Photosensitive composition with o-quinonediazide compound and condensate of dihydric phenol and aldehyde or ketone

Life of this patent

Photosensitive composition with o-quinonediazide compound and condensate of dihydric phenol and aldehyde or ketone

Life of this patent

Abstract

Claims7