Laminated photosensitive material and process for production thereof
AssigneeMita Industrial Co., Ltd.
InventorsKaname Nakatani, Junichi Hanna, Hiroshi Kokado
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AssigneeMita Industrial Co., Ltd.
InventorsKaname Nakatani, Junichi Hanna, Hiroshi Kokado
Estimating the term…
Disclosed is a laminated photosensitive material for the electrophotography, which comprises an electroconductive substrate, a charge-generating layer composed of a vacuum deposition film of metal-free phthalocyanine formed on the substrate and a charge-transporting layer formed on the charge-generating layer, wherein the metal-free phthalocyanine film is a metal-free phthalocyanine particle layer composed mainly of .alpha.-type fine crystals having a crystal particle size of 100 to 2000 .ANG. and the vacuum deposition film has a thickness of 500 to 3000 .ANG. and a dark electroconductivity lower than 10.sup.-10 (.OMEGA.-cm).sup.-1. In this laminated photosensitive material, the initial charge quantity is improved, and the electrophotographic characteristics are stabilized when the photosensitive materials is used repeatedly or continuously.
A laminated photosensitive material for the electrophotography, which comprises an electroconductive substrate, a charge-generating layer composed of a vacuum deposition film of metal-free phthalocyanine formed on the substrate and a charge-transporting layer formed on the charge-generating layer, wherein the metal-free phthalocyanine film is a metal-free phthalocyanine particle layer composed mainly of .alpha.-type fine crystals having a crystal particle size of 100 to 2000 .ANG. and the vacuum deposition film has a thickness of 500 to 3000 .ANG. and a dark electroconductivity lower than 10.sup.-10 (.OMEGA.-cm).sup.-1.
A process for the production of a laminated photosensitive material comprising vacuum-deposition metal-free phthalocyanine on an electrodoncuctive substrate and forming a layer of a charge-transporting substance on the vacuum deposition film, wherein metal-free phthalocyanine is vacuum-depositied in a thickness of 500 to 3000 .ANG. on the electroconductive substrate maintained at a relatively low temperature and the formed vacuum deposition film is contacted with an aromatic organic solvent for a time sufficient to grow .alpha.-form crystals substantially into .alpha.-form crystals having a particle size of 100 to 2000 .ANG..
Dependencies are inferred from the claim text.