Projection device
AssigneeCanon Kabushiki Kaisha
InventorMitsuhiro Tokuhara
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AssigneeCanon Kabushiki Kaisha
InventorMitsuhiro Tokuhara
Estimating the term…
A device for slit-scanning the surface of an original and projecting the image of the surface of the original onto a light-receiving medium comprises an imaging optical system for forming the image of the surface of the original on the light-receiving medium. The imaging optical system has means which, in a first condition, has equal imaging magnifications in orthogonal directions, i.e., the widthwise direction of the slit and the lengthwise direction of the slit and is for keeping the surface of the original and the light-receiving medium in an optically conjugate relation and which, in a second condition, has different imaging magnifications in orthogonal directions, i.e., the widthwise direction of the slit and the lengthwise direction of the slit and is for keeping the surface of the original and the light-receiving medium in an optically conjugate relation in both of the directions.
A device for slit-scanning the surface of an original and projecting the image of the surface of the original onto a light-receiving medium, said device comprising:
A copying apparatus for projecting the image of the surface of an original onto a photosensitive surface by slit scanning, said copying apparatus comprising:
A copying apparatus for projecting the image of an original onto the surface of a photosensitive drum by slit scanning, said copying apparatus comprising:
Dependencies are inferred from the claim text.
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Apparatus for electrographic processes using a charge pattern: for exposing, i.e. imagewise exposure by optically projecting the original image on…
For exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material: with variable magnification
Electrography
Term ended 18 Jun 2004 (estimated)
USPTO file history isn’t available for this patent, so only indexed dates are shown.
1. Field of the Invention
This invention relates to a projection device of the slit scanning type such as, for example, a copying apparatus, and in particular to a projection device in which the magnification of a projected image can be varied.
2. Description of the Prior Art
FIG. 1 shows an embodiment of a copying apparatus to which a projection device according to the present invention is applied.
FIGS. 2A and 2B show an embodiment of the imaging optical system of the projection device according to the present invention.
FIG. 1 shows an embodiment of a copying apparatus to which the projection device of the present invention is applied. Reference numeral 1 designates a platen glass supporting an original thereon and movable in the direction of arrow A.sub.1, reference numeral 2 denotes a slit, reference numeral 3 designates a light source unit comprising a lamp and a reflector and illuminating the original, reference numeral 3' denotes an auxiliary reflecting mirror, reference numerals 4 and 6 designate mirrors for bending the optical path, and reference numeral 5 denotes a rotation-symmetrical main projection lens system which may be, for example, a variable magnification zoom lens and may be moved in the direction of arrow A.sub.2 during a magnification change. Reference numeral 7 designates a photosensitive drum, reference numerals 8 and 9 denote auxiliary lens systems each having an anamorphic imaging characteristic, and reference numeral 10 designates a housing for integrally holding the auxiliary lens systems. The housing 10 is movable in the direction of arrow A.sub.3 and by this movement, the auxiliary lens systems can be put into and out of the optical path. The housing 10 is of course so disposed that it does not intercept the optical path when the auxiliary lens systems 8, 9 are not present in the optical path.
In a first condition, the auxiliary lens systems 8, 9 are disposed outside the optical path and the light flux from the original is projected onto the surface of the photosensitive drum by the main projection lens system 5. In this case, the main projection lens system 5 is a rotation-symmetrical system and therefore, the imaging magnifications in the lengthwise direction and the widthwise direction of the slit which are orthogonal to each other are equal to each other. In a second condition, the housing 10 is moved and the auxiliary lens systems 8, 9 are disposed on the optical path, and the light flux from the original is projected onto the surface of the photosensitive drum by the main projection lens system 5 and the auxiliary lens systems 8, 9. In this case, the imaging magnifications in the lengthwise direction and the widthwise direction of the slit differ from each other, but the original and the photosensitive drum are held optically conjugately in the two directions orthogonal to each other.
An embodiment of the main projection lens system 5 and the auxiliary lens systems 8, 9 shown in FIG. 1 is shown in FIGS. 2A and 2B. FIG. 2A shows a cross-sectional view of the imaging system in the widthwise direction of the slit, and FIG. 2B shows a cross-sectional view of the imaging system in the lengthwise direction of the slit. The main projection lens system 5 is formed by a zoom lens which is of a symmetrical construction with respect to a stop S, and the lens data thereof will be shown below. In the table below, Ri represents the radius of curvature of the ith surface as counted from the original side, Di represents the on-axis thickness or the on-axis air space between the ith surface and the i+1th surface, .nu.d represents the Abbe number of each lens, and n represents the refractive index of each lens