Apparatus for producing a microwave plasma for the treatment of substrates, in particular for the plasma-polymerization of monomers thereon

In apparatus for producing a plasma with microwaves for treating one or more substrates arranged on a planar substrate carrier, the improvement comprising:

• (a) a first elongated slow wave structure for radiating plasma-producing microwaves toward the substrate carrier having a longitudinal axis which is inclined to the plane of the substrate carrier at an acute setting angle;
• (b) a second elongated slow wave structure for radiating plasma-producing microwaves toward the substrate carrier having a longitudinal axis which is inclined to the plane of the substrate carrier at an equal, but opposite acute setting angle,
• (c) the first and second slow wave structures being side by side on the same side of the substrate carrier,
• whereby the intensity of the microwave from the slow wave structures vary oppositely along the axes of the slow wave structures to minimize the net variation of the plasmas on the substrates;
• (d) the slow wave structures each comprising means for defining a median plane of the microwaves therefrom such that the median planes are parallel to each other,
• a pair of stringers extending parallel to the axis of each slow wave structure,
• (f) crossbars extending transversely between the stringers of each slow wave structure,
• (g) the crossbars having crossbars axes in the direction between the stringers of the respective slow wave structures which are spaced from the crossbar axes of the other wave-guide structure,
• (h) the median plane of each slow wave structure being normal to the crossbar axes thereof;
• and
• (i) reaction chamber means for permeably receiving the microwaves and containing an ionizable gas, a polymerizable monomer, and means for moving the substrate carrier in a direction transverse to the axes of the slow wave structures,
• whereby the monomer is converted to a polymer and deposited as a coating on the substrates.

In apparatus for producing a plasma with microwaves for treating one or more substrates arranged on a planar substrate carrier, the improvement comprising:

• (a) a first elongated slow wave structure for radiating plasma-producing microwaves toward the substrate carrier having a longitudinal axis which is inclined to the plane of the substrate carrier at an acute setting angle;
• (b) a second elongated slow wave structure for radiating plasma-producing microwaves towards the substrate carrier having a longitudinal axis which is inclined to the plane of the substrate carrier at an equal, but opposite acute setting angle,
• (c) the first and second slow wave structures being side by side on the same side of the substrate carrier,
• whereby the intensity of the microwave from the slow wave structures vary oppositely along the axes of the slow wave structures to minimize the net variation of the plasmas on the substrates;
• (d) the slow wave structures each comprising means for defining a median plane of the microwaves therefrom such that the median planes intersect in a line on the substrate carrier,
• (e) a pair of stringers extending parallel to the axis of each slow wave structure,
• (f) crossbars extending transversely between the stringers of each slow wave structure,
• (g) the crossbars having crossbar axes in the direction between the stringers of the respective slow wave structures which are spaced from the crossbar axes of the other slow wave structure,
• (h) the median plane of each slow wave structure being normal to the crossbar axes thereof;
• and
• (i) reaction chamber means for permeably receiving the microwaves and containing an ionizable gas, a polymerizable monomer, and means for moving the substrate carrier in a direction transverse to the axes of the slow wave structures,
• whereby the monomer is converted to a polymer and despoited as a coating on the substrates.