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US 4,512,848 AGranted
Procedure for fabrication of microstructures over large areas using physical replication
AssigneeExxon Research & Engineering Co.
InventorsHarry W. Deckman, John H. Dunsmuir
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Abstract
The present invention is an improved replication process which copies a master pattern onto an intermediate transfer mask which is then used to form a lithographic mask on the surface of a substrate. A pattern derived from the original master pattern is then produced in the substrate by an etching process.
Claims14
A process for the negative or positive replication of microstructures from a master comprising:
- (a) coating said master with a layer of film forming polymer material so as to form a negative replica of said microstructures of said master onto one surface of said polymer material, such that said polymer becomes solidified, said material being a single polymeric material;
- (b) separating said single solidified layer of polymer material from said master;
- (c) placing said single solidified layer of polymer material onto a surface of a substrate so as to form a lithographic mask;
- and
- (d) transferring a pattern derived from said lithographic mask to said substrate by etching.
2 more elements
Dependencies are inferred from the claim text.