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US 4,504,646 AGranted
Positive type, radiation-sensitive organic polymer materials
AssigneeHitachi, Ltd.
InventorsKazuo Nate, Takashi Inoue, Hitoshi Yokono
Life of this patent
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Abstract
Aliphatic aldehyde polymer containing at least one Si atom in its molecular chain is a positive type resist having a very high sensitivity to radiation such as electron beams, X-rays, ion beams, etc.
Claims4
A positive type, radiation-sensitive polymer which comprises an aliphatic aldehyde polymer having at least one Si atom in its molecular chain, represented by the general formula (1) or (2):
- ##STR10## wherein R is an alkyl group having 1 to 8 carbon atoms, a halogenated alkyl group, an aralkyl group or a halogenated aralkyl group, each of the groups contains at least one Si atom in its molecular chain at the .beta.-position, and R.sub.1 is an alkyl group having 1 to 8 carbon atoms, a halogenated alkyl group, an aralkyl group or a halogenated aralkyl group and m/n is 0.45/0.55.
A radiation-sensitive polymer having (a) 10 to 100% by mole of one or more repeating units of a formula (1):
- ##STR13## wherein R is an alkyl group having 1 to 8 carbon atoms, a halogenated alkyl group, an aralkyl group or a halogenated aralkyl group, each of the groups contains at least one Si atom, and (b) 90 to 0% by mole of one or more repeating units of a formula (2):
- ##STR14## wherein R.sub.1 is an alkyl group having 1 to 8 carbon atoms, a halogenated alkyl group, an aralkyl group or a halogenated aralkyl group.
Dependencies are inferred from the claim text.