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US 4,486,286 AGranted
Method of depositing a carbon film on a substrate and products obtained thereby
AssigneesNerken Research Corp., Technion Research & Development Foundation Limited
InventorsGerhard Lewin, Dan Nir
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Abstract
There is disclosed a method for depositing a diamond or diamond-like carbon film on at least one substrate employing a hydrocarbon gas and at least one gas which preferentially removes by chemical sputtering other forms of carbon, especially graphite from said film to thereby obtain useful carbon film coated products.
Claims23
A method of forming a diamond-like carbon film on a substrate comprising:
- (a) providing a source of carbon ions;
- (b) directing carbon ions to a substrate under conditions producing a diamond-like carbon film which may contain other forms of carbon;
- (c) providing a source of second ions from a non-hydrocarbon gas in greater than an impurity amount capable of preferentially removing said other forms of carbon by chemical sputtering;
- and
- (d) directing said second ions to said substrate under conditions effective to promote the preferential chemical sputtering of said other forms of carbon in said film.
2 more elements
Dependencies are inferred from the claim text.