US 4,485,759 A · Planetary substrate support apparatus for vapor vacuum deposition coating

Abstract

A substrate support apparatus (40) for reliably rotatably supporting substrates being coated within an evacuated physical vapor deposition chamber, is disclosed. A base member (41) defining one or more work stations (43) is configured and mounted for movement within a deposition coating chamber (20) such that the work station(s) move along a closed path in the chamber, past one or more coating material sources (25). Substrate holder assemblies (50), configured to support one or more substrates (30) to be coated, are mounted for rotation about auxiliary axes (47) at selectable ones of the work stations. Unique bearing means (65, 67), operable over wide temperature variations, rotatably support the substrate holder assemblies and provide good electrical conduction from the base member (41) to the substrates (30). Bearing surfaces (67b) are protected from contamination by the coating plasma (25a). Independent activating means (70, 72) selectively engage and rotate the substrate holder assemblies through predetermined numbers of degrees, at selected positions along the closed path. A simple vane configuration (62, 63) is used for accepting the activating forces. Stabilizing means (80) are provided for supporting unstable substrates upon the substrate holder assemblies (50). Simple attachment and removal of the substrate holder assemblies (50) to and from the base member (41) enhances use-flexibility of the apparatus.

Claims37

Dependent claims

A substrate holder apparatus for rotatably supporting substrates within an evacuated physical vapor deposition chamber during coating processes, comprising:

(a) a base member configured and arranged for mounting in a physical vapor deposition chamber, said base member defining at least one work station thereon;
(b) means operatively connected with said base member for moving said base member in a manner causing said work station to traverse a closed path within said chamber;
(c) a substrate holder suitable for holding at least one substrate to be coated, rotatably mounted to said base member at said work station for rotation about an auxiliary axis, said substrate holder being normally free to move about said auxiliary axis as said substrate holder traverses said closed path;
and
(d) activating means adjacent said closed path for engaging and rotating said substrate holder a predetermined number of degrees about said auxiliary axis as it passes in proximity to said activating means;
whereby a substrate carried by said substrate holder is selectively rotated about said auxiliary axis as the substrate is carried along said closed path.

3 more elements

Dependencies are inferred from the claim text.

Planetary substrate support apparatus for vapor vacuum deposition coating

Life of this patent

Planetary substrate support apparatus for vapor vacuum deposition coating

Life of this patent

Abstract

Claims37