Radiation-resistant copolyesters
AssigneeEastman Kodak Company
InventorGeorge J. O'Neill
Life of this patent
Estimating the term…
Abstract
Disclosed are copolyester compositions derived from about 65-100 mole % 1,4-cyclohexanedicarboxylic acid, about 65-100 mole % 1,4-butanediol and about 15-35 mole % of a compound selected from the group consisting of dimer acid and dimer glycol. These copolyesters are resistant to gamma radiation.
Claims7
Copolyester compositions derived from 100 mole % of a dicarboxylic acid component and 100 mole % of a glycol component, said copolyester consisting essentially of repeat units from about 65-100 mole % 1,4-cyclohexanedicarboxylic acid, about 65-100 mole % 1,4-butanediol and about 15-35 mole % of a compound selected from the group consisting of dimer acid and dimer glycol.
Dependencies are inferred from the claim text.