Waveform producing system employing scanning of a waveform pattern
AssigneeNippon Gakki Seizo Kabushiki Kaisha
InventorTadao Tokushima
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AssigneeNippon Gakki Seizo Kabushiki Kaisha
InventorTadao Tokushima
Estimating the term…
A waveform producing system in which a source of infrared radiation or magnetic flux in a pattern forming section applies energy to a mask constituting a pattern-forming device that passes and masks the radiation or flux for passing the radiation or flux in a pattern which represents a waveform in a coordinate system with axes of time and amplitude in a plane. This distributes the radiation or flux and amplitude in a plane, and distributes the radiation or flux spatially in a pattern corresponding to the waveform. A matrix of transducers in series within parallel rows in a conversion section receive the radiation or flux passed and converts it to electrical signals which have a sampled value of the waveform. The sampled values thus obtained are scanned subsequentially in the direction of the time axis by a sequential readout circuit and the outputs of the sampled values are arranged sequentially with time to develop the waveform.
A waveform producing system which comprises:
A waveform producing system which comprises:
A waveform producing system which comprises:
A waveform producing system which comprises:
A waveform producing system which comprises:
Dependencies are inferred from the claim text.